题 目：Beyond lithography: a 3D nanoprinting paradigm shift

报告人：冯继成　研究员

单 位：上海科技大学

时 间：2024/12/13　10:00

地 点：综合楼二层228报告厅

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附简介：

冯继成现任上海科技大学研究员、博士生导师和AIL课题组长。入选中组部国家级青年人才计划、上海市海外高层次引进人才；专注于3D纳米打印和原子制造系统/设备的研制，作为第一发明人已申请了PCT专利3项、国家发明专利10 项；主持国家自然基金委重大研究计划(培育)和张江国家实验室青年创新专项；相关工作已发表于Nature，Matter，Nature Communications,Advanced Materials等，多篇工作被遴选为期刊封面成果，也相继被Nature Electronics,Nature Communications,Matter等亮点报道。

Integrated circuits (ICs) fabrication requires cutting-edge nanoengineering techniques. The prevailingapproach to enhancingcomputational power has been to miniaturize components in ICs. However, challenges arise due to the technological constraints of downsizing, interconnections, and materializing these components. Nanoscale 3D printing emerges as a promising solution to these challenges. At Aerosol Intelligence Laboratory (AIL), we have developed a method to print aerosols into expansive arrays of intricate 3D nanoarchitectures using “lines of forces”. This technique is called “Faraday 3D Printing”, inspired by Faraday’s original field of lines, which are here repurposed as 3D nano-drawing tools. Distinct from wavelength-limited techniques, these drawing tools possess no downsizing limit, heralding a horizon for atomic-level manufacturing. Our proprietary system uncovers the vast potential of multi-material printing, a prospect that has remained largely untapped. By adeptly manipulating electric and flow fields, we attain remarkable flexibility in material selection and wafer-scale printing, all while ensuring a high precision. This technology offers the capability to tailor optical, electronic, and mechanical attributes by modifying the material, geometry, feature size, and array periodicity of the printed nanoarchitectures. We contend that the transition from lithography to 3D printing within the spheres of nanoelectronics and nanophotonics signals a monumental paradigm shift, setting the research agenda of AIL for the future.

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